This inventor holds 2 USPTO granted patents. Top assignee: Nitta Corporation. Active years: 2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2003
Title: Takashi Ando: Innovator in Polishing Technology
Introduction
Takashi Ando is a notable inventor based in Nara, Japan. He has made significant contributions to the field of polishing technology, particularly through his innovative patents. With a total of 2 patents, Ando has developed solutions that enhance the efficiency and effectiveness of polishing machines.
Latest Patents
Ando's latest patents include a wafer retainer and a method for attaching/detaching the wafer retainer to/from a polishing machine base plate. This wafer retainer features a foam layer that can adsorb a wafer in a detachable manner. It includes a first pressure-sensitive adhesive layer, a support, and a second pressure-sensitive adhesive layer designed for adherence to the polishing machine's base plate. The adhesive composition contains a pressure-sensitive adhesive and a side-chain crystallizable polymer, which is crucial for its functionality.
Another significant patent by Ando is related to a polishing cloth and the method for attaching/detaching it to/from a polishing machine base plate. This polishing cloth consists of a substrate, a first pressure-sensitive adhesive layer, a support, and a second pressure-sensitive adhesive layer. Similar to his wafer retainer, the adhesive composition in this patent also includes a side-chain crystallizable polymer, ensuring optimal performance during polishing operations.
Career Highlights
Takashi Ando is associated with Nitta Corporation, where he applies his expertise in developing advanced polishing technologies. His work has been instrumental in improving the efficiency of polishing processes, which are critical in various manufacturing sectors.
Collaborations
Ando collaborates with talented coworkers, including Shinichiro Kawahara and Toshiaki Kasazaki. Their combined efforts contribute to the innovative advancements in polishing technology at Nitta Corporation.
Conclusion
Takashi Ando's contributions to polishing technology through his patents demonstrate his commitment to innovation and excellence. His work continues to influence the industry, paving the way for more efficient polishing solutions.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile