Kawasaki, Japan

Takanori Suwa

USPTO Granted Patents = 3 

Average Co-Inventor Count = 3.3

ph-index = 1


Company Filing History:


Years Active: 2011-2012

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3 patents (USPTO):Explore Patents

Title: Takanori Suwa: Innovator in Electron Emitting Devices

Introduction

Takanori Suwa is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of electron emitting devices, holding a total of 3 patents. His work focuses on enhancing the efficiency and stability of electron beam apparatuses.

Latest Patents

One of Suwa's latest patents is an "Electron emitting device and image displaying apparatus using the same." This invention features an electron beam apparatus that includes an insulator with a notch, a gate positioned on the insulator's surface, and at least one cathode with a protruding portion. The design aims to achieve high electron emission efficiency while ensuring stability and effective convergence of emitted electrons. Another notable patent is the "Electron beam apparatus and image display apparatus using the same," which addresses the deformation of the gate caused by Coulomb force. By maintaining the appropriate relationship between the film thickness of the gate and the distance from the insulating member's outer surface, this invention prevents variations in electron emission characteristics, thereby enhancing the reliability of the device.

Career Highlights

Takanori Suwa is associated with Canon Kabushiki Kaisha, a leading company in imaging and optical products. His work at Canon has allowed him to focus on innovative technologies that push the boundaries of electron emission and display systems.

Collaborations

Suwa has collaborated with notable colleagues such as Hisanobu Azuma and Toshiharu Sumiya. Their combined expertise has contributed to the advancement of technologies in their field.

Conclusion

Takanori Suwa's contributions to electron emitting devices have significantly impacted the technology landscape. His innovative patents reflect a commitment to improving efficiency and stability in electron beam apparatuses.

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