Company Filing History:
Years Active: 1997-1998
Title: The Innovations of Takamasa Kosai
Introduction
Takamasa Kosai is a notable inventor based in Tenri, Japan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to enhancing semiconductor device performance.
Latest Patents
His latest patents include a semiconductor device formed within asymmetrically-shaped seed crystals. In this invention, catalyst elements are introduced into an amorphous silicon film to accelerate crystallization. After patterning the amorphous silicon films into an island pattern, a heat treatment is conducted for crystallization. This process allows the catalyst elements to efficiently diffuse only within the island-patterned amorphous silicon films. Consequently, a high-quality crystalline silicon film is produced, characterized by a crystal growth direction aligned in one direction and devoid of grain boundaries. This technology enables the fabrication of semiconductor devices with high performance and stable characteristics across the entire substrate, regardless of device size.
Another significant patent is a method for fabricating a semiconductor device using a catalyst. Similar to his previous invention, catalyst elements are introduced into an amorphous silicon film, followed by patterning and heat treatment. This method also results in a high-quality crystalline silicon film, facilitating the efficient production of high-performance semiconductor devices.
Career Highlights
Takamasa Kosai is associated with Sharp Kabushiki Kaisha Corporation, where he continues to innovate in semiconductor technology. His work has contributed to advancements in the efficiency and performance of semiconductor devices.
Collaborations
He has collaborated with notable coworkers, including Naoki Makita and Takashi Funai, further enhancing the innovative environment in which he works.
Conclusion
Takamasa Kosai's contributions to semiconductor technology through his patents reflect his commitment to innovation and excellence. His work continues to influence the development of high-performance semiconductor devices, showcasing the importance of research and collaboration in advancing technology.