Odawara, Japan

Takahiro Ogawa


Average Co-Inventor Count = 3.0

ph-index = 5

Forward Citations = 46(Granted Patents)


Location History:

  • Odawara, JP (1991 - 1993)
  • Hachioji, JP (1993)
  • Hino, JP (1994 - 1995)

Company Filing History:


Years Active: 1991-1995

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6 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Takahiro Ogawa

Introduction

Takahiro Ogawa is a prominent inventor based in Odawara, Japan. He has made significant contributions to the field of photographic materials and printing technologies. With a total of 6 patents to his name, Ogawa continues to push the boundaries of innovation in his industry.

Latest Patents

One of his latest patents is a method of making a printing mask sheet. This invention includes a mask for forming an image on photographic print paper, which consists of a mask sheet, a transparent protective layer, and a transparent intermediate layer. The mask sheet features a transparent base sheet and an opaque pattern layer shaped like the image on the base sheet. The transparent protective layer is placed over the mask sheet to safeguard the opaque pattern layer, while the intermediate layer, which has a softening temperature not exceeding 100 degrees Celsius, is positioned between the mask sheet and the protective layer. Another notable patent involves a photographic material comprising a protective layer and its preparing method. This material includes a photographic print and a protective layer applied to the image layer of the photographic print using a coating of latex that contains a resin with a glass transition temperature ranging from 30 to 70 degrees Celsius.

Career Highlights

Takahiro Ogawa is currently employed at Konica Corporation, where he applies his expertise in developing innovative photographic solutions. His work has significantly impacted the industry, enhancing the quality and efficiency of photographic materials.

Collaborations

Ogawa collaborates with talented individuals such as Sota Kawakami and Shun Takada, contributing to a dynamic and innovative work environment.

Conclusion

Takahiro Ogawa's contributions to the field of photographic technology exemplify his commitment to innovation. His patents reflect a deep understanding of materials and processes that enhance photographic quality. His work continues to inspire advancements in the industry.

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