Joetsu, Japan

Takahiro Kishita

USPTO Granted Patents = 6 

 

Average Co-Inventor Count = 2.9

ph-index = 2

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2017-2021

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6 patents (USPTO):Explore Patents

Title: Takahiro Kishita: Innovator in Photomask Technology

Introduction

Takahiro Kishita is a prominent inventor based in Joetsu, Japan. He has made significant contributions to the field of photomask technology, holding a total of 6 patents. His work focuses on methods and materials that enhance the quality and functionality of photomasks used in photolithography.

Latest Patents

Kishita's latest patents include a method of evaluating photomask blank-associated substrates. This innovative method involves taking an image of the substrate's surface to acquire a surface image, then determining the contrast of that image. The evaluation process is based on the acquired contrast, allowing for a convenient assessment of the surface conditions of the photomask blank-associated substrate. Another notable patent is for a photomask blank that is processed into a transmissive photomask. This photomask blank consists of a transparent substrate, a first film that can be etched by chlorine/oxygen-based dry etching, and a second film made of a silicon-containing material. The second film is designed to have specific optical properties, enhancing its effectiveness in photolithography.

Career Highlights

Kishita is currently employed at Shin-Etsu Chemical Co., Ltd., where he continues to develop innovative solutions in the field of photomask technology. His work has been instrumental in advancing the capabilities of photomasks, which are critical in the semiconductor manufacturing process.

Collaborations

Throughout his career, Kishita has collaborated with notable colleagues, including Tsuneo Terasawa and Hiroshi Fukuda. These collaborations have contributed to the development of cutting-edge technologies in the industry.

Conclusion

Takahiro Kishita is a key figure in the advancement of photomask technology, with a focus on innovative methods and materials. His contributions have significantly impacted the field, making him a respected inventor in the industry.

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