Takafumi Hisamitsu

Title: Takafumi Hisamitsu: Innovator in Oxide Film Technology

Introduction

Takafumi Hisamitsu is a notable inventor based in Sagamihara, Japan. He has made significant contributions to the field of oxide film technology, holding a total of 3 patents. His work focuses on innovative methods for forming oxide films, which are essential in various technological applications.

Latest Patents

One of Hisamitsu's latest patents is related to a shower plate and an oxide film forming method. This method involves providing a precursor to a reaction space that includes a substrate and a susceptor. The process forms an oxide film on the substrate by introducing at least one of CxOy and NxOy as a reactant gas into the reaction space. This is done while applying a pulse RF power with a duty cycle of less than 60% to an RF plate, generating plasma of the reactant gas. The RF plate is positioned in the reaction space to face the susceptor, and the providing and forming steps are repeated a predetermined number of times.

Career Highlights

Takafumi Hisamitsu is currently employed at Asm IP Holding B.V., where he continues to develop and refine his innovative technologies. His expertise in oxide film formation has positioned him as a key player in the industry.

Collaborations

Hisamitsu collaborates with talented individuals such as Yozo Ikedo and Seiji Okura, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

Takafumi Hisamitsu's contributions to oxide film technology and his innovative methods have made a significant impact in his field. His work continues to influence advancements in technology and materials science.