Company Filing History:
Years Active: 2009
Title: Takafumi Fukushima: Innovator in Reaction Development Patterning
Introduction
Takafumi Fukushima is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of image formation through innovative methods. His work primarily focuses on the development of a unique reaction development patterning process.
Latest Patents
Fukushima holds a patent for a "Method for forming image through reaction development." This invention pertains to a reaction development patterning process where a photo resist layer, masked by a desired pattern, is irradiated with ultraviolet light. Following this, the layer is washed using a solvent solution containing alkali. The photo resist layer comprises a condensation type polymer with carbonyl groups bonded to hetero atoms and a photo acid generating agent. The alkali used in this process is characterized as an amine. This innovative method allows for the use of photo resist target resins that contain bonds with low reactivity toward nucleophilic reagents, such as condensation type polymers with carbonate, ester, urethane, and amide bonds.
Career Highlights
Fukushima is currently associated with Yokohama Tlo Company, Ltd., where he continues to advance his research and development efforts. His work has been instrumental in enhancing the efficiency and effectiveness of image formation technologies.
Collaborations
Fukushima collaborates with Masao Tomoi, contributing to the development of innovative solutions in their field.
Conclusion
Takafumi Fukushima's contributions to the field of reaction development patterning highlight his innovative spirit and dedication to advancing technology. His patent reflects a significant step forward in image formation processes, showcasing his expertise and commitment to innovation.