Location History:
- Koza, JP (1979)
- Kanagawa, JP (1980 - 1982)
Company Filing History:
Years Active: 1979-1982
Title: Taizo Ohashi: Innovator in Semiconductor Surface Treatment
Introduction
Taizo Ohashi is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the development of surface-treating agents. With a total of 3 patents to his name, his work has had a considerable impact on the efficiency and effectiveness of semiconductor production processes.
Latest Patents
Ohashi's latest patents focus on a surface-treating agent formed of an aqueous solution containing 0.01 to 20% by weight of trialkyl(hydroxyalkyl) ammonium hydroxide. This innovative treating agent is designed for the effective removal of organic and inorganic contaminants deposited on the surfaces of intermediate semiconductor products. It also facilitates the efficient etching of metal layers used as wiring in semiconductor devices. Furthermore, the agent can eliminate portions of a positive working photoresist film coated on the surfaces of intermediate semiconductor products, which are either exposed or not exposed to light, by controlling its concentration.
Career Highlights
Taizo Ohashi is currently associated with Tokyo Shibaura Electric Co., Ltd., where he continues to advance his research and development efforts in semiconductor technology. His work has been instrumental in enhancing the manufacturing processes of semiconductor devices, contributing to the overall efficiency and reliability of these essential components.
Collaborations
Ohashi has collaborated with notable colleagues such as Hisashi Muraoka and Masafumi Asano. Their combined expertise has fostered innovation and progress in the field of semiconductor surface treatment.
Conclusion
In summary, Taizo Ohashi is a distinguished inventor whose work in semiconductor surface treatment has led to significant advancements in the industry. His innovative patents and collaborations continue to shape the future of semiconductor manufacturing.