Company Filing History:
Years Active: 1995
Title: Taizo Ejima: Innovator in Chemical Vapor Deposition Technology
Introduction
Taizo Ejima is a notable inventor based in Fukuoka, Japan. He has made significant contributions to the field of chemical vapor deposition technology. His innovative approach has led to advancements that enhance the efficiency and accuracy of film deposition processes.
Latest Patents
Taizo Ejima holds a patent for a reaction chamber designed for a chemical vapor deposition apparatus. The main feature of this invention is to provide a reaction chamber that achieves uniform film deposition with high accuracy and stability. The apparatus includes a wafer heating stage that holds and heats the wafer while rotating about its center. A gas supplying head is positioned to supply reaction gas towards the wafer heating stage, creating a constant spacing region. The reaction chamber is designed to ensure that the spacing region is closed, with an exhaust outlet configured to discharge gas upwards obliquely.
Career Highlights
Taizo Ejima is associated with Mitsubishi Electric Corporation, where he has been instrumental in developing advanced technologies in the semiconductor manufacturing sector. His work has contributed to improving the performance and reliability of chemical vapor deposition systems.
Collaborations
Throughout his career, Taizo Ejima has collaborated with notable colleagues, including Koichiro Tsutahara and Toru Yamaguchi. These collaborations have fostered innovation and have led to the successful development of various technologies in the field.
Conclusion
Taizo Ejima's contributions to chemical vapor deposition technology exemplify the impact of innovative thinking in the semiconductor industry. His patent reflects a commitment to enhancing manufacturing processes, ensuring high-quality results in film deposition.