Tai-shung Chung

Title: Innovations of Tai-shung Chung in Membrane Technology

Introduction

Tai-shung Chung is a prominent inventor based in Ann Arbor, MI (US), known for his significant contributions to membrane technology. He holds a total of 10 patents, showcasing his expertise and innovative spirit in the field. His work primarily focuses on developing advanced materials for various applications, particularly in the dehydration of acidic solvents.

Latest Patents

One of Tai-shung Chung's latest patents is the development of an acid-resistant polybenzidimazole (PBI) membrane for pervaporation dehydration of acidic solvents. This innovative membrane is chemically modified through processes such as sulfonation, phosphonation, cross-linking, and N-substitution. The membrane is thermally stabilized, enhancing its performance in harsh conditions. The method for dehydrating an acid material involves contacting an acidic aqueous solution, such as acetic acid, with the acid-resistant PBI membrane. This process allows for the extraction of a permeate stream rich in water and a concentrate stream rich in the acid material.

Career Highlights

Throughout his career, Tai-shung Chung has worked with esteemed institutions, including the National University of Singapore and BASF SE Corporation. His experience in these organizations has contributed to his development of cutting-edge technologies and innovative solutions in membrane science.

Collaborations

Tai-shung Chung has collaborated with notable professionals in his field, including Martin Weber and Christian Maletzko. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in membrane technology.

Conclusion

Tai-shung Chung's contributions to membrane technology, particularly through his innovative patents, have made a significant impact in the field. His work continues to inspire advancements in the dehydration of acidic solvents and other applications.