Taek-ryong Chung

Title: Inventor Spotlight: Taek-ryong Chung

Introduction

Taek-ryong Chung, an esteemed inventor based in Kyungki-do, South Korea, has made significant contributions to the field of semiconductor technology. His innovative thinking and technical expertise have led to the development of a unique patent focusing on improving the etching processes used in microfabrication.

Latest Patents

Chung holds a patent titled "Method of Reducing Notching During Reactive Ion Etching." This method addresses a common issue encountered during reactive ion etching (RIE), where notching can occur while passing through a silicon layer in multi-layered structures. The patented method involves forming an insulating layer on a silicon substrate, creating trenches, filling those trenches with a silicon layer, and patterning the silicon to define etch regions. This approach significantly minimizes notching without the need for a metal layer, enhancing efficiency in semiconductor manufacturing.

Career Highlights

Taek-ryong Chung is a valuable member of Samsung Electronics Co., Ltd., where he applies his expertise to develop groundbreaking technologies. His work in advancing semiconductor processes contributes greatly to the overall performance and reliability of electronic devices. His singular patent reflects his commitment to solving real-world engineering challenges.

Collaborations

During his career, Chung has collaborated with esteemed colleagues including Byeung-leul Lee and Joon-hyock Choi. Together, they work on innovative projects aimed at pushing the boundaries of semiconductor research and development.

Conclusion

With a strong focus on innovation and improvement, Taek-ryong Chung exemplifies the spirit of invention that drives technological advancement in today’s world. His contributions through his patented method not only demonstrate his expertise but also pave the way for future innovations in the semiconductor industry.