Taehwan Lee

Title: Innovations of Taehwan Lee in Plasma Processing Technology

Introduction

Taehwan Lee is an accomplished inventor based in Santa Clara, CA. He has made significant contributions to the field of plasma processing technology, particularly in enhancing etching selectivity. His innovative methods are crucial for advancements in semiconductor manufacturing.

Latest Patents

Taehwan Lee holds a patent for a "Method of enhancing etching selectivity using a pulsed plasma." This patent describes a process for etching a first dielectric material on a substrate within a plasma processing chamber. The method involves delivering a process gas that includes a fluorocarbon gas, generating a plasma using a radio frequency signal, and establishing a pulsed voltage waveform at a biasing electrode. This innovative approach improves the efficiency and selectivity of the etching process.

Career Highlights

Taehwan Lee is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work focuses on developing advanced technologies that enhance manufacturing processes. With his expertise, he has contributed to the company's reputation for innovation and excellence in the field.

Collaborations

Throughout his career, Taehwan Lee has collaborated with notable colleagues, including Hailong Zhou and Sean S Kang. These collaborations have fostered a productive environment for innovation and have led to significant advancements in their respective fields.

Conclusion

Taehwan Lee's contributions to plasma processing technology exemplify the importance of innovation in the semiconductor industry. His patented methods and collaborative efforts continue to drive advancements that benefit the field.