Taeha Suh

Title: Taeha Suh: Innovator in Semiconductor Technology

Introduction

Taeha Suh is a prominent inventor based in Suwon-si, South Korea. He is known for his contributions to semiconductor technology, particularly in the development of innovative devices that enhance performance and efficiency.

Latest Patents

Taeha Suh holds a patent for a semiconductor device that includes a substrate featuring a first active pattern with first and second source/drain regions of a cell region. The device incorporates a device isolation layer in a trench defining the first active pattern, a buffer layer on the cell region, and a line structure that extends in a third direction. This structure connects the cell region to a boundary region and includes a first conductive pattern that passes through the buffer layer to contact the first source/drain region. Additionally, the device features a bit line on the first conductive pattern, a first barrier pattern between the bit line and the first conductive pattern, and a pair of spacers on both sidewalls of the line structure. Other components include a contact on the second source/drain region, a landing pad on the contact, a first abrasive particle between the contact and the landing pad, and a data storage element on the landing pad.

Career Highlights

Taeha Suh is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of semiconductor technology. His work has significantly contributed to advancements in the field, making him a valuable asset to the company.

Collaborations

Taeha has collaborated with notable colleagues, including Jihye Son and Hojoong Kim, who have also made significant contributions to their respective fields.

Conclusion

Taeha Suh's innovative work in semiconductor devices exemplifies the importance of research and development in technology. His contributions continue to shape the future of electronics and data storage solutions.