Kyunggido, South Korea

Tae Suk Chung


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Innovations of Tae Suk Chung in Microwave Dielectric Composition

Introduction

Tae Suk Chung is a notable inventor based in Kyunggido, South Korea. He has made significant contributions to the field of microwave dielectric materials. His innovative work focuses on enhancing the properties of dielectric compositions used in various applications.

Latest Patents

Tae Suk Chung holds a patent for a microwave dielectric composition and the method for preparing it. This composition is characterized by its superior dielectric constant, product of resonant frequency by quality coefficient, and a minimal temperature-dependent coefficient of resonant frequency. The preparation involves mixing a main oxide formulation consisting of lead oxide, calcium oxide, zirconium oxide, and tin oxide with manganous nitrate. The mixture is then calcined at temperatures ranging from 1,000 to 1,200 degrees Celsius, followed by pulverization, molding, and sintering at temperatures between 1,200 and 1,550 degrees Celsius in an oxygen atmosphere. The resulting composition boasts a dielectric constant of 100 or greater, a product of resonant frequency by quality coefficient of 4,000 or greater, and a temperature-dependent coefficient of resonant frequency of ±3 mmp/°C or less.

Career Highlights

Tae Suk Chung is affiliated with the Korea Advanced Institute of Science and Technology, where he continues to advance research in microwave materials. His work has garnered attention for its potential applications in telecommunications and electronics.

Collaborations

He collaborates with esteemed colleagues, including Ho Gi Kim and Yung Park, who contribute to his research endeavors.

Conclusion

Tae Suk Chung's innovative contributions to microwave dielectric compositions highlight his expertise and commitment to advancing technology in this field. His patent reflects a significant step forward in the development of materials with enhanced properties for various applications.

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