Tokushima, Japan

Tadamitsu Iritani



Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2006-2009

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2 patents (USPTO):Explore Patents

Title: Tadamitsu Iritani: Innovator in Distance Measurement Technology

Introduction

Tadamitsu Iritani is a notable inventor based in Tokushima, Japan. He has made significant contributions to the field of distance measurement technology, holding 2 patents that showcase his innovative approach to solving complex measurement challenges.

Latest Patents

Iritani's latest patents include a distance measuring device, distance measuring method, and distance measuring program. The distance measuring device utilizes a transmission unit that emits an electromagnetic wave at a specific frequency. A detecting unit performs synchronous detection on the reflected wave, extracting the in-phase and quadrature components. An analysis signal generating unit then mixes these components to generate an analysis signal, allowing for precise distance measurement through Fourier transform techniques. His distance measurement method emphasizes high resolution by controlling the frequency of a voltage-controlled oscillator, enabling accurate detection of the distance to a target through the analysis of standing waves.

Career Highlights

Throughout his career, Tadamitsu Iritani has worked with reputable organizations, including Shima Seiki Manufacturing Limited and the University of Tokushima. His experience in these institutions has allowed him to refine his skills and contribute to advancements in measurement technology.

Collaborations

Iritani has collaborated with notable colleagues such as Tetsuji Uebo and Kazuhiro Wakabayashi. Their combined expertise has likely fostered innovative solutions in their respective fields.

Conclusion

Tadamitsu Iritani's work in distance measurement technology exemplifies the impact of innovative thinking in engineering. His patents reflect a commitment to enhancing measurement accuracy and efficiency, contributing to advancements in various applications.

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