T S Ravi

Title: T S Ravi: Innovator in Low Dielectric Constant Thin Films

Introduction

T S Ravi is a notable inventor based in San Jose, CA (US). He has made significant contributions to the field of materials science, particularly in the development of low dielectric constant thin films. His innovative approach has led to advancements in semiconductor manufacturing processes.

Latest Patents

T S Ravi holds a patent for the "Deposition of low dielectric constant thin film without use of an oxidizer." This patent describes a method where an organic precursor compound is gasified and introduced into the reaction chamber of a high density plasma chemical vapor deposition (HDP-CVD) reactor. The organic precursor comprises silicon, oxygen, and carbon atoms. Notably, no reactive oxygen gas or other oxidizers are utilized in the reaction chamber. This process allows for the deposition of a thin film of carbon-containing low dielectric constant silicon oxide material, which is simultaneously etched to fill gaps with high aspect ratios using low dielectric constant insulator material. He has 1 patent to his name.

Career Highlights

T S Ravi is currently employed at Novellus Systems Incorporated, a company known for its innovative solutions in semiconductor manufacturing. His work has been instrumental in enhancing the efficiency and effectiveness of thin film deposition techniques.

Collaborations

T S Ravi has collaborated with various professionals in his field, including his coworker Darin Scott Olson. Their combined expertise has contributed to the advancement of technologies in semiconductor fabrication.

Conclusion

T S Ravi's contributions to the field of low dielectric constant thin films demonstrate his innovative spirit and commitment to advancing semiconductor technology. His work continues to influence the industry and pave the way for future innovations.