Princeton, NJ, United States of America

Szymon Marek Rusinkiewicz

USPTO Granted Patents = 4 

Average Co-Inventor Count = 4.8

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2010-2019

Loading Chart...
4 patents (USPTO):Explore Patents

Title: Innovations of Szymon Marek Rusinkiewicz

Introduction

Szymon Marek Rusinkiewicz is a notable inventor based in Princeton, NJ, with a significant contribution to the field of optics and light manipulation. He holds four patents that showcase his innovative approaches to designing surfaces that interact with light in unique ways. His work has implications in various industries, including entertainment and technology.

Latest Patents

One of his latest patents is titled "Reflective and refractive surfaces configured to project desired caustic pattern." This patent describes techniques for designing and manufacturing surfaces that produce specific images when illuminated by a light source. The desired image can be decomposed into a collection of Gaussian kernels, and the shape of a micropatch lens corresponding to each Gaussian is determined. These micropatch lenses are assembled to create a continuous surface that approximates the desired image formed from multiple Gaussian caustics. This technique can be utilized to design light-redirecting surfaces suitable for milling or other manufacturing processes.

Another significant patent is "Computational highlight holography." This technique fabricates a highlight hologram based on a digital object by performing point sampling on the object and representing each sampled point as a geometric patch. A set of geometric patches corresponding to the sampled points is fabricated into a substrate. Paraboloid patches are used for reflective substrates, while hyperboloids are used for transmissive substrates. To avoid impractical overlapping patches, certain sample points are merged, resulting in an output set of grooves that can specify the fabrication of a highlight hologram on a physical substrate.

Career Highlights

Szymon has worked with prominent companies such as Disney Enterprises, Inc. and Mitsubishi Electric Research Laboratories, Inc. His experience in these organizations has allowed him to apply his innovative ideas in practical settings, contributing to advancements in technology and design.

Collaborations

He has collaborated with notable individuals in his field, including Wojciech Matusik and Marios Papas. These collaborations have further enriched his work and expanded the impact of his inventions.

Conclusion

Szymon Marek Rusinkiewicz is a distinguished inventor whose patents reflect his innovative spirit and expertise in optics. His contributions to the field continue to influence advancements in light manipulation and design.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…