Kobe, Japan

Syuhei Kuri


Average Co-Inventor Count = 7.0

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2017

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2 patents (USPTO):Explore Patents

Title: Syuhei Kuri: Innovator in Liquid Metal Technologies

Introduction

Syuhei Kuri is a notable inventor based in Kobe, Japan. He has made significant contributions to the field of liquid metal technologies, holding a total of 2 patents. His innovative work focuses on enhancing the efficiency and functionality of liquid metal systems.

Latest Patents

Kuri's latest patents include a quench tank and a liquid metal target forming apparatus. The quench tank is designed to be part of a circulation path in a liquid metal loop. It effectively separates and cools liquid metal steam or mixed gas introduced into the tank body. The tank features a separating area that creates a substantially horizontal flow of liquid metal, with an inclined separating plate positioned inside the tank body. The liquid metal target forming apparatus includes a nozzle that ejects liquid metal to form a target in space, which is then irradiated with a proton beam. The discharge port of the nozzle has a concavo-convex shape, optimizing the region that receives the proton beam.

Career Highlights

Throughout his career, Syuhei Kuri has worked with prominent organizations such as Mitsubishi Heavy Industries Mechatronics Systems, Ltd. and Osaka University. His experience in these institutions has allowed him to develop and refine his innovative ideas in liquid metal technologies.

Collaborations

Kuri has collaborated with esteemed colleagues, including Izuru Matsushita and Hiroshi Horiike. Their combined expertise has contributed to advancements in the field and has fostered a collaborative environment for innovation.

Conclusion

Syuhei Kuri's contributions to liquid metal technologies through his patents and collaborations highlight his role as a significant inventor in this specialized field. His work continues to influence advancements in liquid metal applications.

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