Susumu Matsuda

Title: Innovations by Susumu Matsuda

Introduction

Susumu Matsuda is a notable inventor based in Nara-ken, Japan. He has made significant contributions to the field of substrate drying methods and apparatuses. With a total of 2 patents, Matsuda's work focuses on improving drying efficiency and reducing particle attachment on substrates.

Latest Patents

Matsuda's latest patents include a substrate drying method and apparatus. This invention aims to reduce the attachment of particles to substrate surfaces when exposed from pure water. It also prevents non-uniform drying by enhancing the drying efficiency of the substrates. The method involves supplying air or an inert gas, along with gaseous or droplet-like isopropyl alcohol (IPA), into a drying chamber. The pure water is drained from the liquid level while raising the substrates, allowing for effective drying.

Another significant patent is the wafer drying device and method. In this invention, nitrogen gas is jetted into a drying chamber where wafers are immersed in pure water. Liquid-phase isopropyl alcohol is simultaneously jetted at a higher temperature than the wafers. This process replaces the pure water on the wafer surfaces with mist-form isopropyl alcohol, which is then evaporated to achieve drying.

Career Highlights

Matsuda is currently employed at Toho Kasei Co., Ltd., where he continues to innovate in the field of drying technologies. His work has been instrumental in advancing methods that enhance the efficiency of substrate and wafer drying processes.

Collaborations

Matsuda has collaborated with notable coworkers, including Yoshio Takemura and Yutaka Kedo. Their combined expertise contributes to the development of innovative solutions in their field.

Conclusion

Susumu Matsuda's contributions to substrate drying technologies reflect his commitment to innovation and efficiency. His patents demonstrate a clear understanding of the challenges in the drying process and offer effective solutions.