Susumu Karino

Title: Susumu Karino: Innovator in Plasma CVD Technology

Introduction

Susumu Karino is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of plasma technology, particularly in the development of apparatuses used in vacuum treatment processes. His innovative work has led to the creation of a patent that enhances the efficiency and effectiveness of protective film formation.

Latest Patents

Karino holds a patent for a Plasma CVD apparatus and vacuum treatment apparatus. This invention includes a protective film formation chamber designed to create a carbon protective film on a magnetic film. The apparatus features a gas introduction part for introducing source gas into a vacuum vessel, a discharge electrode positioned to face a substrate, and a plasma formation part that applies voltage to generate plasma. Additionally, it incorporates a permanent magnet with opposing magnetic poles and a no-erosion-portion mask to optimize the film formation process.

Career Highlights

Karino is associated with Canon Anelva Corporation, where he has been instrumental in advancing plasma technology. His work has not only contributed to the company's portfolio but has also positioned him as a key figure in the field of vacuum treatment apparatuses.

Collaborations

Throughout his career, Karino has collaborated with esteemed colleagues such as Hiroshi Yakushiji and Masahiro Shibamoto. These collaborations have fostered an environment of innovation and have led to the successful development of advanced technologies in their field.

Conclusion

Susumu Karino's contributions to plasma technology and vacuum treatment apparatuses exemplify the spirit of innovation. His patent and collaborative efforts continue to influence advancements in the industry.