Sung Mee Park

Title: Innovations of Sung Mee Park

Introduction

Sung Mee Park is an accomplished inventor based in Atlanta, GA, known for his contributions to the field of electroluminescent fabrics. With a total of two patents to his name, Park has made significant strides in the development of innovative textile technologies.

Latest Patents

One of Park's latest patents is titled "Electroluminescent fabric embedding illuminated fabric display." This invention discloses an electroluminescent fabric that comprises a foundation layer made of synthetic, regenerated, or natural fibers, along with several stacked layers including a polymer layer, bus bars, a transparent electrode layer, a fluorescent layer, a dielectric layer, and an interface electrode layer. This complex structure allows for the integration of illuminated displays into fabric.

Another notable patent is "Flexible printed conductive fabric and method for fabricating the same." This patent describes a conductive fabric that consists of a base layer made from synthetic, regenerated, or natural fibers, a conductive layer that can be formed into pre-designed electric patterns, and an insulating layer to protect the conductive layer from damage.

Career Highlights

Sung Mee Park is currently associated with Kolon Glotech, Inc., where he continues to innovate in the field of textile technology. His work focuses on creating fabrics that not only serve traditional purposes but also incorporate advanced functionalities.

Collaborations

Park collaborates with talented individuals such as Kwang Su Cho and Kyung Hee Chung, who contribute to the innovative projects at Kolon Glotech, Inc.

Conclusion

Sung Mee Park's contributions to the field of electroluminescent fabrics and conductive textiles highlight his role as a leading inventor in the industry. His innovative patents pave the way for future advancements in textile technology.