Company Filing History:
Years Active: 2015
Title: Innovations of Sung-Bai Lee in Plasma Ion Implantation Technology.
Introduction
Sung-Bai Lee is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of plasma ion implantation technology. His innovative work has led to the development of a unique method and apparatus that enhances the efficiency of solid element implantation.
Latest Patents
Sung-Bai Lee holds a patent for a "Method and apparatus for plasma ion implantation of solid element." This patent describes an apparatus and method that enable plasma ion implantation of a solid element. The process involves placing a sample on a sample stage within a vacuum chamber, which is maintained in a vacuum state. Gas is supplied to the chamber, and a first pulsed DC power is applied to a magnetron sputtering source to generate plasma ions of a solid element. The plasma ions are then implanted onto the surface of the sample. The first power is a pulse DC power that applies high power momentarily while maintaining low average power. Additionally, a second power may be supplied to the sample stage, which is a high negative voltage pulse that accelerates the plasma ions towards the sample. This process is synchronized with the pulse DC power for the magnetron sputtering source. Furthermore, inductively coupled plasma can be generated in the vacuum chamber via an antenna to increase the ionization rate of the solid element and lower the operational pressure of the magnetron sputtering source.
Career Highlights
Sung-Bai Lee is affiliated with the Korea Institute of Science and Technology, where he continues to advance research in plasma ion implantation. His work has garnered attention for its potential applications in various industries, including semiconductor manufacturing and materials science.
Collaborations
Sung-Bai Lee has collaborated with notable colleagues such as Seung-Hee Han and Ji-Young Byun. Their combined expertise has contributed to the advancement of research in their field.
Conclusion
Sung-Bai Lee's innovative contributions to plasma ion implantation technology demonstrate his commitment to advancing scientific research. His patent reflects a significant step forward in the efficiency of solid element implantation processes.