Kanagawa-ken, Japan

Sunao Meguro


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:

goldMedal1 out of 832,843 
Other
 patents

Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Innovations by Sunao Meguro in Printed Circuit Board Technology

Introduction

Sunao Meguro is a notable inventor based in Kanagawa-ken, Japan. He has made significant contributions to the field of printed circuit board technology. His innovative approach has led to the development of a unique process for forming through holes in substrates used in printed circuit boards.

Latest Patents

Sunao Meguro holds 1 patent for his invention titled "Process for forming through holes in substrate of printed circuit board." This patent describes a method where one or more through holes are created in a printed circuit board substrate made of a resinous dielectric sheet. The process involves using a laser to form cavities on one surface of the dielectric sheet, ensuring that these cavities do not penetrate the conductive layer on the opposite side. The cavities are then filled with a liquid photoresist layer, and small areas are defined through photolithography, leading to the successful formation of through holes.

Career Highlights

Throughout his career, Sunao Meguro has focused on enhancing the efficiency and effectiveness of printed circuit board manufacturing. His innovative techniques have contributed to advancements in the electronics industry, particularly in the design and functionality of circuit boards.

Collaborations

Sunao Meguro has collaborated with esteemed colleagues such as Chong-Ren Maa and Hong-Ming Lin. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Sunao Meguro's contributions to printed circuit board technology exemplify the spirit of innovation. His patented process for forming through holes has the potential to significantly impact the electronics industry. His work continues to inspire future advancements in this critical field.

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