Sukwoo Park

Title: Sukwoo Park: Innovator in Masking Film Technology

Introduction

Sukwoo Park is a notable inventor based in Richmond, VA (US). He has made significant contributions to the field of materials science, particularly in the development of innovative masking films. His work focuses on creating solutions that protect sensitive substrates during various applications.

Latest Patents

Sukwoo Park holds a patent for a masking film designed to protect sensitive substrates. This innovative masking film features an adhesion layer that consists of a blend of hydrogenated styrene block copolymer and low-density polyethylene. The adhesion layer is engineered with an outer adhesion surface that is specifically configured to contact a substrate. This surface has an average roughness Ra ranging from 100 nm to 350 nm, and an average spacing between peaks Sm of between 20 µm and 150 µm. Additionally, the masking film includes a release layer on the side of the adhesion layer opposite the outer adhesion surface. This patent showcases his expertise in creating advanced materials that meet industry needs.

Career Highlights

Sukwoo Park is currently employed at Tredegar Surface Protection, LLC, where he continues to innovate in the field of surface protection technologies. His work at Tredegar has allowed him to apply his knowledge and skills in developing products that enhance the performance and reliability of various substrates.

Collaborations

Throughout his career, Sukwoo has collaborated with several talented individuals, including Gregory K. Jones and Bankim Bhupendra Desai. These collaborations have contributed to the advancement of technology in the field of surface protection.

Conclusion

Sukwoo Park is a distinguished inventor whose work in masking film technology has made a significant impact in the industry. His innovative solutions continue to pave the way for advancements in material science and surface protection.