Company Filing History:
Years Active: 2013-2015
Title: The Innovations of Suk-Dong Hong
Introduction
Suk-Dong Hong is a notable inventor based in Busan, South Korea. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of high pressure gas annealing. With a total of 2 patents to his name, his work has the potential to enhance the efficiency and safety of semiconductor processes.
Latest Patents
Suk-Dong Hong's latest patents include a "Computer readable medium for high pressure gas annealing" and a "Method for high pressure gas annealing." Both patents focus on novel methods and apparatuses for annealing semiconductor devices in a high pressure gas environment. According to the embodiments described, the annealing vessel features a dual chamber structure. This design confines potentially toxic, flammable, or otherwise reactive gas in an inner chamber, which is protected by inert gas pressures in the outer chamber. The incoming gas delivery system and exhaust gas venting system are also safeguarded by various methods. These innovations can be utilized for high-K gate dielectric anneal, post metallization sintering anneal, and forming gas anneal in the semiconductor manufacturing process.
Career Highlights
Suk-Dong Hong is currently employed at Poongsan Microtec Corporation, where he continues to develop cutting-edge technologies in semiconductor manufacturing. His expertise in high pressure gas annealing has positioned him as a key player in the industry.
Collaborations
Suk-Dong Hong has collaborated with notable colleagues such as Sang-Shin Kim and Manuel Rivera. Their combined efforts contribute to the advancement of semiconductor technologies and innovations.
Conclusion
Suk-Dong Hong's contributions to the field of semiconductor manufacturing through his innovative patents demonstrate his commitment to enhancing industry practices. His work not only addresses current challenges but also paves the way for future advancements in technology.