Palm Bay, FL, United States of America

Steven T Slasor


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 1999

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations by Steven T. Slasor in Wafer Cleaning Processes

Introduction

Steven T. Slasor is an accomplished inventor based in Palm Bay, FL (US). He holds a patent for a significant innovation in the field of semiconductor manufacturing. His work focuses on improving the pre-thermal treatment processes for silicon wafers, which are crucial in the production of high-quality semiconductor devices.

Latest Patents

Steven T. Slasor's patent, titled "SC-2 based pre-thermal treatment wafer cleaning process," outlines a method for pre-heat-treatment processing of silicon wafers. This process involves an initial step of contacting the wafer with a pre-clean SC-1 bath, resulting in a highly particle-free silicon wafer surface. Following a deionized water rinse, the wafer is treated with an aqueous solution containing hydrofluoric acid and hydrochloric acid to eliminate metallic-containing oxides from the surface. The final step utilizes an SC-2 bath, which contains hydrogen peroxide and a dilute concentration of metal-scouring hydrochloric acid, to grow a hydrophilic oxide layer. This innovative cleaning process ensures that the resulting silicon oxide layer has a metal concentration no greater than 1×10⁹, significantly enhancing the diffusion length of minority carriers from approximately 500-600 microns to 800-900 microns.

Career Highlights

Steven T. Slasor is associated with Harris Corporation, where he has contributed to advancements in semiconductor technology. His expertise in wafer cleaning processes has positioned him as a valuable asset in the field of electronics manufacturing. His innovative approach has the potential to improve the efficiency and quality of semiconductor devices.

Collaborations

Some of Steven's notable coworkers include Jack H. Linn and George V. Rouse. Their collaboration has likely contributed to the development and refinement of innovative technologies within their organization.

Conclusion

Steven T. Slasor's contributions to the field of semiconductor manufacturing through his patented wafer cleaning process demonstrate his commitment to innovation. His work not only enhances the quality of silicon wafers but also plays a crucial role in advancing semiconductor technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…