Steven M Katz

Title: The Innovations of Steven M Katz

Introduction

Steven M Katz is a notable inventor based in Baltimore, MD (US). He has made significant contributions to the field of integrated circuit fabrication. His work focuses on enhancing the sensitivity and contrast of photoresists used in semiconductor manufacturing.

Latest Patents

Katz holds a patent for a technology titled "Resists with enhanced sensitivity and contrast." This invention involves a PMGI bilayer resist that increases sensitivity to light. The innovation is achieved through the addition of cyclic anhydrides to the resist, along with the formation of a bilayer resist structure. This structure features a portable conforming mask with a desirable undercut profile, which is essential for the lift-off of patterned metallic circuitry. He has 1 patent to his name.

Career Highlights

Steven M Katz is associated with the International Business Machines Corporation, commonly known as IBM. His role at IBM has allowed him to work on cutting-edge technologies that push the boundaries of integrated circuit design and manufacturing.

Collaborations

Katz has collaborated with several talented individuals in his field, including James A Jubinsky and Christopher F Lyons. These collaborations have contributed to the advancement of technologies in semiconductor fabrication.

Conclusion

Steven M Katz's innovative work in the realm of photoresists has made a significant impact on integrated circuit fabrication. His contributions continue to influence the semiconductor industry and pave the way for future advancements.