Steven J Kirch

Title: The Innovations of Steven J Kirch: Pioneering Advances in Ion Beam Technology and Laser Etching

Introduction

Steven J Kirch, an inventive mind based in Lagrangeville, NY, has made significant contributions to the field of technology through his innovative patents. With a portfolio that includes two notable patents, Kirch's work focuses primarily on advancements in ion beam deposition and high-energy laser systems.

Latest Patents

One of Kirch's latest patents is centered around "Gas delivery for ion beam deposition and etching." This unique ion beam structure features a gas container designed with first and second apertures, allowing a narrow ion beam to engage with target specimens. The design includes deflection means to apply voltages and magnetic fields, enhancing the collection of secondary charged particles for better image quality. Additionally, the system introduces a gas containing specific particles into the ion beam's pathway, facilitating repairs or modifications to the specimen's surface.

Kirch's second patent, "High energy laser mask and method of making same," presents a novel mask engineered for laser projection etching systems. This mask comprises patterned multiple dielectric layers with varying refractive indices placed on a UV-grade synthetic fused silica substrate. By maximizing reflectivity and transmissivity of laser energy in distinct areas, this innovation ensures durability against high-energy lasers, marking a significant enhancement in etching technologies.

Career Highlights

Kirch's career includes significant tenures at prominent companies, notably the International Business Machines Corporation (IBM). His experience in this field has equipped him with deep insights into the practical applications of his inventions.

Collaborations

Throughout his career, Kirch has collaborated with esteemed colleagues such as John R Lankard and John J Ritsko. These partnerships have played a crucial role in developing innovative technologies that facilitate advancements in both ion beam and laser processing methodologies.

Conclusion

Steven J Kirch's inventive journey is characterized by groundbreaking patents that push the boundaries of technology in ion beam deposition and laser etching. His ability to merge theoretical concepts with practical applications is a testament to his innovative spirit and commitment to advancing technology. As his work continues to evolve, it promises to leave a lasting impact on the fields of manufacturing and materials science.