Huntington Beach, CA, United States of America

Steven E Babayan


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 173(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Steven E. Babayan

Introduction

Steven E. Babayan is an inventive engineer based in Huntington Beach, California, known for his impactful contributions to plasma technology. With a focus on improving methods of substrate processing, Babayan holds a patent that enhances the capabilities of plasma flow devices and reactors.

Latest Patents

Babayan's notable patent is titled "Method of processing a substrate." This invention features a plasma flow device or reactor, characterized by a housing that includes conductive electrodes with openings designed to facilitate gas flow. The device utilizes radio frequency (RF) sources to power one or more electrodes while grounding others. The unique design ensures that substrates or work pieces are uniformly contacted by reactive gases across large surface areas. The invention has multiple applications; it can effectively strip organic materials, kill biological microorganisms, activate surfaces, etch materials, and deposit thin films onto substrates.

Career Highlights

Steven E. Babayan works at the University of California, where he engages in pioneering research and development in the field of plasma technology. His expertise has significantly advanced techniques used in substrate processing, contributing to innovations that find their application across various industries.

Collaborations

In his professional journey, Babayan has collaborated with Robert F. Hicks, another expert in the field. Together, they explore advancements in plasma-related technologies, focusing on applications that enhance material processing and surface treatment methods.

Conclusion

Steven E. Babayan's innovations reflect his deep understanding of plasma technologies and their practical applications. Through his patent and collaborative efforts, he continues to push the boundaries of substrate processing, solidifying his place as a notable inventor in the realm of plasma technology.

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