Steven A Lyons

Title: Innovations of Steven A. Lyons in E-beam Lithography

Introduction

Steven A. Lyons is an accomplished inventor based in Oakland, California. He holds a patent that significantly enhances the field of E-beam lithography. His innovative approach has the potential to improve the resolution of selectable feature widths in lithographic systems.

Latest Patents

Lyons' notable patent is titled "Virtual addressing for E-beam lithography." This technique is performed in a fixed address particle beam lithographic system. The writing is executed in the conventional manner for creating patterns, such as stripes on a resist with a selected feature width. An additional row of alternate pixels is written either before or after the selected feature, which results in a feature width approximately 1/2 a pixel wider than the selected width. This enhancement is due to the blurring of the latent image caused by the scattering of the particle beam within the resist. The technique not only improves resolution but also maintains throughput efficiency. It can also be utilized to lengthen a feature by 1/2 a pixel width. The invention is primarily disclosed in a raster scan machine, but it is also applicable in a vector scan machine.

Career Highlights

Steven A. Lyons is associated with the PerkinElmer Corporation, where he contributes his expertise in the field of lithography. His work has been instrumental in advancing technologies that are crucial for various applications in the semiconductor industry.

Collaborations

Lyons has collaborated with notable colleagues, including Charles S. Biechler and Allen M. Carroll. Their combined efforts have contributed to the development of innovative solutions in E-beam lithography.

Conclusion

Steven A. Lyons is a key figure in the advancement of E-beam lithography through his innovative patent. His contributions have the potential to significantly impact the efficiency and resolution of lithographic processes.