Stephen W Hymes

Title: The Innovative Contributions of Stephen W Hymes

Introduction

Stephen W Hymes is a notable inventor based in Austin, TX (US). He has made significant contributions to the field of electrochemical deposition, particularly in the selective deposition of copper. His innovative methods have implications for various applications in electronics and materials science.

Latest Patents

Hymes holds a patent for a method titled "Site-selective electrochemical deposition of copper." This patent describes a process that includes forming a layer of dielectric material above a structure layer, followed by the creation of a conductive layer. An opening is formed in both the conductive layer and the dielectric material, allowing for the selective formation of at least one barrier metal layer and a copper seed layer only within the opening. This method ensures that the barrier metal layer and the copper seed layer are conductively coupled to the conductive layer. Additionally, an insulating layer is formed above the conductive layer, and copper is selectively electrochemically deposited only in the opening. Hymes has 1 patent to his name.

Career Highlights

Stephen W Hymes is currently employed at Advanced Micro Devices, Inc., where he continues to work on innovative technologies that advance the field of semiconductor manufacturing. His expertise in electrochemical processes has positioned him as a valuable asset in the industry.

Collaborations

Hymes collaborates with various professionals in his field, including his coworker Thomas M Brown. Their combined efforts contribute to the development of cutting-edge technologies in semiconductor applications.

Conclusion

Stephen W Hymes is a distinguished inventor whose work in site-selective electrochemical deposition of copper showcases his innovative spirit and technical expertise. His contributions continue to influence advancements in the semiconductor industry.