Company Filing History:
Years Active: 2005
Title: Innovations by Inventor Stefan Lingel
Introduction
Stefan Lingel is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of chemical mechanical polishing (CMP) with a focus on improving the efficiency and effectiveness of the polishing process. With a total of 2 patents to his name, Lingel's work is recognized for its innovative approaches to substrate polishing.
Latest Patents
Lingel's latest patents include a method of controlling the chemical mechanical polishing of stacked layers having a surface topology. This improved CMP controller calculates the polish time required for removing a patterned layer stack to a desired final thickness. The controller utilizes the initial layer thickness of each layer in the stack, a topography factor characterizing the surface structure, and a selectivity ratio of removal rates between adjacent material layers. Additionally, the controller's state variable, represented by the removal rate of one of the layers, can be periodically updated based on previously calculated polish times and measurements of the final layer thickness. This innovation is particularly beneficial for CMP processes in STI isolation structures, where precise control of the final thickness of a CMP stop layer is crucial.
Another significant patent by Lingel is a system for chemical mechanical polishing that features an improved pad conditioner. This system conditions the polishing pad by directing a fluid jet to its surface, thereby eliminating the need for expensive consumables like diamond conditioning pads. This advancement not only reduces costs but also minimizes the risk of substrate scratches caused by lost diamonds from the conditioning pad.
Career Highlights
Stefan Lingel is currently employed at Advanced Micro Devices Corporation, where he continues to develop innovative solutions in the field of semiconductor manufacturing. His work has contributed to advancements in CMP technology, enhancing the quality and efficiency of semiconductor devices.
Collaborations
Lingel collaborates with talented professionals in his field, including Matthias Kuhn and Dirk Wollstein. Their combined expertise fosters a creative environment that drives innovation in CMP processes.
Conclusion
Stefan Lingel's contributions to the field of chemical mechanical polishing demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in substrate polishing, paving the way for advancements in semiconductor manufacturing.