Company Filing History:
Years Active: 2006-2008
Title: The Innovative Contributions of Stefan Hirscher
Introduction: Stefan Hirscher, an accomplished inventor based in Waldburg, Germany, has made significant strides in the field of lithography through his innovative methods and patents. With a total of two patents to his name, Hirscher's contributions have had a notable impact on the technology utilized in reflection masks.
Latest Patents: Hirscher's latest patents focus on a method for determining the optimal absorber stack geometry of a lithographic reflection mask. The invention involves a systematic approach to designing a reflection layer and a patterned absorber stack, which includes a buffer layer and an absorber layer. By simulating aerial images across different absorber stack geometries, the method aims to identify the process windows associated with each design. The optimal geometry is determined by evaluating the maximum process window size, enhancing the performance and efficacy of lithographic processes. Additionally, this invention encompasses methodologies for fabricating lithographic reflection masks and further innovations in that domain.
Career Highlights: Currently associated with Infineon Technologies AG, Stefan Hirscher has played a pivotal role in advancing techniques that enhance the quality and precision of lithographic processes. His expertise in the area has established him as a key figure in his company and the wider industry.
Collaborations: Hirscher collaborates with fellow inventor Frank-Michael Kamm, sharing insights and innovations that contribute to the overarching goals of their projects. These partnerships foster a productive environment that enables the development of cutting-edge technological advancements in the field.
Conclusion: As an inventor, Stefan Hirscher continues to drive innovation in lithographic technology. His methods for optimizing absorber stack geometries play a crucial role in improving the efficiency of lithographic reflection masks. With ongoing contributions to Infineon Technologies AG, Hirscher's work exemplifies the dynamism and potential of innovation within the tech industry.