Stayce Parmer

Title: Stayce Parmer: Innovator in Chamber Component Cleaning Methods

Introduction

Stayce Parmer is a notable inventor based in Santa Clara, CA, who has made significant contributions to the field of materials processing. With a focus on improving the efficiency of cleaning methods for chamber components, her work has implications for various industries, particularly in semiconductor manufacturing.

Latest Patents

Stayce Parmer holds a patent for "Methods for removing deposits on the surface of a chamber component." This innovative method involves receiving a chamber component and fixing it in a fixture. A slurry with a pH of about 5 to about 9 is then applied to the surface of the chamber component. The surface is polished using a polish pad and the slurry, ensuring that the surface roughness after polishing remains within about 10% of its original state. This method effectively removes deposits from the surface of the chamber component. Additionally, an alternative method is presented, which involves heating the chamber component to a temperature ranging from about 500° C. to about 1500° C.

Career Highlights

Stayce Parmer is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering and semiconductor manufacturing. Her work at Applied Materials has allowed her to develop and refine her innovative cleaning methods, contributing to the company's reputation for excellence in technology solutions.

Collaborations

Throughout her career, Stayce has collaborated with talented individuals such as Tuochuan Huang and Min Shen. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Stayce Parmer's contributions to the field of chamber component cleaning methods highlight her role as an influential inventor. Her innovative approaches not only enhance cleaning efficiency but also support advancements in semiconductor manufacturing.