Dresden, Germany

Stanley Rehn

This inventor holds 1 USPTO granted patent. Top assignee: Von Ardenne Anlagentechnik Gmbh. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Stanley Rehn. Retrieved from https://idiyas.com/inventor/stanley-rehn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: The Innovations of Stanley Rehn

Introduction

Stanley Rehn is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of sputtering technology, particularly through his innovative patent. His work is recognized for enhancing the efficiency of sputtering installations, which are crucial in various manufacturing processes.

Latest Patents

Stanley Rehn holds a patent for a "Sputtering installation with two longitudinally placed magnetrons." This invention features two longitudinally extended magnetrons positioned next to each other, each equipped with a target on its upper side. The design aims to increase the utilization of the targets by homogenizing the discharge resistance along the directrix. This ensures that the partial discharge resistance of any target point is consistent with that of other target points, thereby optimizing performance.

Career Highlights

Rehn is associated with Von Ardenne Anlagentechnik GmbH, a company known for its advanced technology solutions in the field of vacuum coating and surface treatment. His role at the company has allowed him to apply his innovative ideas in practical settings, contributing to the advancement of sputtering technology.

Collaborations

Some of his notable coworkers include Johannes Struempfel and Guenter Beister. Their collaboration has likely fostered an environment of innovation and creativity, leading to advancements in their respective fields.

Conclusion

Stanley Rehn's contributions to sputtering technology through his patent demonstrate his commitment to innovation and efficiency. His work continues to influence the industry, showcasing the importance of inventive minds in technological advancement.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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