Srikanth Balaji Samavedan

Title: Innovator Spotlight: Srikanth Balaji Samavedan

Introduction

Srikanth Balaji Samavedan, an accomplished inventor based in Cohoes, NY, has made significant contributions to the field of semiconductor technology. With two patents to his name, he continues to push the boundaries of innovation in his professional journey.

Latest Patents

Samavedan's latest innovation focuses on reducing source/drain parasitic capacitance in FinFET-based semiconductor structures having tucked fins. His patented method provides a comprehensive approach, starting with a semiconductor substrate featuring fins and integrated dummy transistors. The process involves removing dummy gates and gate caps to create gate trenches while protecting specific areas during fabrication to mitigate parasitic capacitance. The resulting structure consists of a semiconductor substrate with integrated FinFETs that include air-gaps in gate trenches, achieving a remarkable reduction in parasitic capacitance—by at least 75 percent compared to structures without air-gaps.

Career Highlights

Samavedan is currently associated with GlobalFoundries Inc., a leading semiconductor manufacturing company. His work at GlobalFoundries signifies his commitment to advancing semiconductor technologies and enhancing the performance of electronic devices through innovative solutions.

Collaborations

In his endeavors, Samavedan collaborates with talented colleagues such as Manfred Eller and Min-Hwa Chi. Together, they foster an environment of creativity and invention, contributing to the cutting-edge developments in semiconductor technology.

Conclusion

As an inventor, Srikanth Balaji Samavedan's work encapsulates the essence of innovation in engineering and semiconductor design. His patents not only contribute to technological advancements but also pave the way for future developments in the industry.