Sourav K Sengupta

Title: Innovations of Sourav K Sengupta in Plasma Technology

Introduction

Sourav K Sengupta is an accomplished inventor based in Newark, DE (US). He has made significant contributions to the field of plasma technology, particularly in the generation and use of reactive precursors for advanced materials. His innovative approach has the potential to enhance various applications, including semiconductor layers and solar cells.

Latest Patents

Sengupta holds a patent for a method involving the plasma-induced, in-situ generation, transport, and use or collection of reactive precursors. This invention describes a process where a beam or flow of a reactive or metastable precursor, such as a hydride or organometallic compound, is created and utilized to treat substrates. The apparatus consists of three zones, each playing a crucial role in generating and directing the reactive gas to modify advanced materials.

Career Highlights

Sourav K Sengupta is affiliated with the University of Delaware, where he continues to advance his research in plasma technology. His work has garnered attention for its innovative approach to material treatment and precursor generation. With 1 patent to his name, he is recognized for his contributions to the field.

Collaborations

Sengupta has collaborated with notable colleagues, including Henry C Foley and Robert D Varrin, Jr. These partnerships have further enriched his research and development efforts in plasma technology.

Conclusion

Sourav K Sengupta's innovative work in plasma technology exemplifies the potential for advancements in material treatment processes. His contributions are paving the way for future developments in the field.