Company Filing History:
Years Active: 2011
Title: Innovations of Soon Jin Chua in Zinc Oxide Film Growth
Introduction
Soon Jin Chua is a notable inventor based in Singapore, recognized for his contributions to the field of materials science. He has developed a unique method for growing high-quality zinc oxide films, which has significant implications for electronic and optoelectronic devices. His innovative approach has garnered attention in both academic and industrial circles.
Latest Patents
Soon Jin Chua holds a patent for a method of zinc oxide film grown on an epitaxial lateral overgrowth gallium nitride template. This patent outlines a growth method that includes several key steps: first, growing a gallium nitride layer on a sapphire substrate at approximately 1000°C. Next, a SiO mask is patterned into stripes oriented in the gallium nitride <100> or <110> direction. The process continues with the epitaxial lateral overgrowth of gallium nitride layers, where facet planes are controlled by selecting the appropriate growth temperature and reactor. Finally, zinc oxide films are deposited on the facets of the ELO gallium nitride templates using chemical vapor deposition (CVD). This method enables the growth of high-quality zinc oxide crystals with a reduced number of crystal defects, achieving a low dislocation density of less than 10/cm.
Career Highlights
Soon Jin Chua is affiliated with the National University of Singapore, where he conducts research and development in materials science. His work has not only advanced the understanding of zinc oxide film growth but has also paved the way for future applications in various electronic devices. His innovative techniques are expected to play a crucial role in the development of next-generation technologies.
Collaborations
Throughout his career, Soon Jin Chua has collaborated with esteemed colleagues, including Hailong Zhou and Jianyi Lin. These collaborations have further enriched his research and contributed to the advancement of the field.
Conclusion
Soon Jin Chua's innovative methods in zinc oxide film growth represent a significant advancement in materials science. His contributions are poised to impact the future of electronic and optoelectronic devices, showcasing the importance of research and innovation in technology development.