Company Filing History:
Years Active: 2024
Title: Innovations of Soo Yeon Sim in CMP Slurry Composition
Introduction
Soo Yeon Sim is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor manufacturing, particularly in the development of chemical mechanical polishing (CMP) technologies.
Latest Patents
Soo Yeon Sim holds a patent for a CMP slurry composition designed for polishing tungsten pattern wafers. The patent, titled "CMP slurry composition for polishing tungsten pattern wafer and method of polishing tungsten pattern wafer using the same," describes a composition that includes a solvent, an abrasive agent, and a dendritic poly(amidoamine) with a terminal functional group that has a pKa of about 6 or less. This innovation is crucial for enhancing the efficiency and effectiveness of the polishing process in semiconductor fabrication.
Career Highlights
Soo Yeon Sim is currently employed at Samsung SDI Co., Inc., where he continues to work on advancements in semiconductor technologies. His expertise in CMP processes has positioned him as a valuable asset within the company.
Collaborations
Some of his coworkers include Ji Ho Lee and Young Gi Lee, who collaborate with him on various projects related to semiconductor innovations.
Conclusion
Soo Yeon Sim's contributions to CMP slurry compositions reflect his dedication to advancing semiconductor manufacturing technologies. His work not only enhances the efficiency of the polishing process but also showcases the importance of innovation in the industry.