Company Filing History:
2 out of 42,508 
1 out of 1 
1 out of 1,157 
Years Active: 1987
Title: Soichi Torisawa: Innovator in Photolithography
Introduction
Soichi Torisawa is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of photolithography, particularly in the development of technologies that enhance the precision of pattern exposure on photoresists. With a total of 2 patents to his name, Torisawa's work has had a lasting impact on the industry.
Latest Patents
One of Torisawa's latest patents is focused on the "Exposure of uniform fine pattern on photoresist." This innovation involves controlling the humidity and temperature of the gas supplied to an exposure apparatus, which is separate from the ambient atmosphere. By maintaining a controlled environment, the water content in the photoresist remains uniform, allowing for consistent pattern widths across the surface.
Another significant patent is the "Protective cover" for photoprinting systems. This invention features a cover made of a transparent thin plate of inorganic material, equipped with an antireflection multiple coating. The design includes a spacer that keeps the inner surface of the cover away from the surface to be protected, such as the pattern surface of a photomask. The use of inorganic material enhances the mechanical strength of the cover while minimizing light absorption and reflection issues.
Career Highlights
Throughout his career, Soichi Torisawa has worked with prominent companies, including Hitachi, Ltd. and VEB Carl Zeiss Jena. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in photolithography.
Collaborations
Torisawa has collaborated with notable professionals in the field, including Yasuhiro Koizumi and Walter Gartner. These partnerships have further enriched his work and expanded the reach of his innovations.
Conclusion
Soichi Torisawa's contributions to photolithography through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in the field, ensuring precision and efficiency in photoprinting technologies.