Suita, Japan

Sinji Tamura


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 57(Granted Patents)


Company Filing History:


Years Active: 1984

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1 patent (USPTO):Explore Patents

Title: The Innovations of Sinji Tamura: A Pioneer in Photosensitive Materials

Introduction

Sinji Tamura, an inventive mind hailing from Suita, Japan, is recognized for her significant contribution to the field of materials science. With a remarkable patent portfolio, Tamura has paved the way for advancements in photosensitive materials, crucial for various applications, especially in the printing and coating industries.

Latest Patents

Sinji Tamura holds one notable patent pertaining to a unique photosensitive material. This innovative copolymer comprises a monomer featuring a C.sub.7 to C.sub.21 perfluoroalkyl or perfluoroalkenyl group at one end, and an ethylenically unsaturated group at the other end. Additionally, it includes a monomer with a photosensitive group such as an azidobenzoyloxy group, cinnamoyloxy group, benzoylphenyl group, or an alpha, beta-unsaturated ketone group. This copolymer exhibits excellent photosensitivity along with exceptional water and oil-repellent properties. Its versatility makes it valuable for applications such as dry offset printing plates, resist materials, and photo-curable coatings.

Career Highlights

Sinji Tamura's professional journey is closely linked with Daikin Kogyo Co., Ltd., a prominent company that emphasizes innovative solutions and sustainable materials. Her dedication to advancing photosensitive technologies has solidified her reputation as a key contributor to her company's mission.

Collaborations

Tamura has collaborated with esteemed colleagues, including Takahiro Tsunoda and Tsuguo Yamaoka. Their partnerships have fostered a collaborative environment that drives creativity and innovation in developing new materials and technologies.

Conclusion

In conclusion, Sinji Tamura's innovative work within the realm of photosensitive materials exemplifies her passion for advancing science and technology. Her patent stands as a testament to her expertise and dedication, contributing substantially to modern industrial applications and setting the stage for future innovations in the field.

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