Brockport, NY, United States of America

Silas Owusu-Nkwantabisah


Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2019-2020

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2 patents (USPTO):Explore Patents

Title: Silas Owusu-Nkwantabisah: Innovator in Polymer Technology

Introduction

Silas Owusu-Nkwantabisah is a notable inventor based in Brockport, NY (US). He has made significant contributions to the field of polymer technology, holding 2 patents that showcase his innovative approach to material science.

Latest Patents

His latest patents include a "Method for providing textured, porous polymeric films." This invention involves creating textured and porous organic polymeric films by subjecting swellable organic polymeric films to supercritical carbon dioxide under specific pressure and force conditions. The resulting films exhibit surface wrinkles with an average peak to valley height ranging from 1 µm to 3,000 µm, and a porosity of at least 10%.

Another significant patent is the "Method of providing photopatterned functional surfaces." This method allows for the preparation of articles with surface regions that have varying contact angles. By utilizing a reactive silane material and imagewise UV exposure, the process creates distinct reacted and latent reaction regions. This innovation enables the application of compositions that are selectively attracted to either of the regions, enhancing functionality.

Career Highlights

Silas is currently employed at Eastman Kodak Company, where he continues to push the boundaries of polymer research and development. His work has not only advanced the field but has also contributed to the company's innovative product offerings.

Collaborations

He collaborates with talented coworkers, including Roberta Dileo Benedict and David Y Wang, who share his passion for innovation and contribute to the success of their projects.

Conclusion

Silas Owusu-Nkwantabisah exemplifies the spirit of innovation in polymer technology through his patents and contributions at Eastman Kodak Company. His work continues to inspire advancements in material science and functional surfaces.

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