Company Filing History:
Years Active: 1985
Title: Siegfried G Plonski: Innovator in X-ray Lithography
Introduction
Siegfried G Plonski is a notable inventor based in Santa Ana, California. He has made significant contributions to the field of X-ray lithography, particularly through his innovative patent. His work has implications for various applications in technology and manufacturing.
Latest Patents
Siegfried holds a patent for an "Embedded absorber X-ray mask and method for making same." This invention features a mask that is especially useful in X-ray lithography, wherein the X-ray absorber material is embedded in the mask membrane. This advancement enhances the precision and efficiency of X-ray lithography processes.
Career Highlights
Siegfried is associated with Rockwell International Corporation, where he has been able to apply his expertise in developing cutting-edge technologies. His role at the company has allowed him to contribute to significant projects and innovations in the field.
Collaborations
Siegfried has worked alongside his coworker, Addison B Jones, who has also contributed to advancements in their shared field. Their collaboration has fostered an environment of innovation and creativity.
Conclusion
Siegfried G Plonski's contributions to X-ray lithography through his patent and work at Rockwell International Corporation highlight his role as an influential inventor. His innovative spirit continues to drive advancements in technology.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.