Company Filing History:
Years Active: 1985
Title: Siegfried G Plonski: Innovator in X-ray Lithography
Introduction
Siegfried G Plonski is a notable inventor based in Santa Ana, California. He has made significant contributions to the field of X-ray lithography, particularly through his innovative patent. His work has implications for various applications in technology and manufacturing.
Latest Patents
Siegfried holds a patent for an "Embedded absorber X-ray mask and method for making same." This invention features a mask that is especially useful in X-ray lithography, wherein the X-ray absorber material is embedded in the mask membrane. This advancement enhances the precision and efficiency of X-ray lithography processes.
Career Highlights
Siegfried is associated with Rockwell International Corporation, where he has been able to apply his expertise in developing cutting-edge technologies. His role at the company has allowed him to contribute to significant projects and innovations in the field.
Collaborations
Siegfried has worked alongside his coworker, Addison B Jones, who has also contributed to advancements in their shared field. Their collaboration has fostered an environment of innovation and creativity.
Conclusion
Siegfried G Plonski's contributions to X-ray lithography through his patent and work at Rockwell International Corporation highlight his role as an influential inventor. His innovative spirit continues to drive advancements in technology.