Siebe Jorna

Title: Siebe Jorna: Innovator in Laser Technology

Introduction

Siebe Jorna is a notable inventor based in Ann Arbor, MI (US). He has made significant contributions to the field of laser technology, holding two patents that showcase his innovative approach to laser amplification and attenuation.

Latest Patents

One of his latest patents is the "Multiple Pass Laser Amplifier System." This invention presents a laser amplification method aimed at increasing energy extraction efficiency from laser amplifiers. It also reduces the energy flux that passes through a flux-limited system. The system includes apparatus for decomposing a linearly polarized light beam into multiple components, passing these components through an amplifier in a delayed time sequence, and recombining the amplified components into an in-phase linearly polarized beam.

Another significant patent is the "Apodizer Aperture for Lasers." This invention is an aperture attenuator designed for use with high-power lasers. It features glass windows shaped and assembled to form an annulus chamber filled with a dye solution. The annulus chamber is uniquely shaped so that the section aligned with the axis of the incident beam follows a curve represented by the equation y = (r - r.sub.o).sup.n.

Career Highlights

Siebe Jorna is currently associated with KMS Fusion, Inc., where he continues to develop innovative solutions in laser technology. His work has been instrumental in advancing the efficiency and effectiveness of laser systems.

Collaborations

He has collaborated with notable colleagues, including Keith A. Brueckner and N. Kent Moncur, contributing to a dynamic and innovative work environment.

Conclusion

Siebe Jorna's contributions to laser technology through his patents reflect his commitment to innovation and excellence in the field. His work continues to influence advancements in laser applications and efficiency.