Company Filing History:
Years Active: 2007
Title: Innovations of Sidorkin Vadim in Electron-Beam Lithography
Introduction
Sidorkin Vadim is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of electron-beam lithography, particularly through his innovative patent. His work is instrumental in advancing the technology used in semiconductor manufacturing.
Latest Patents
Vadim holds a patent for an "Electromagnetic focusing method for electron-beam lithography system." This method involves projecting a predetermined pattern of an electron beam from an emitter to a wafer within a vacuum chamber. The process begins by setting an initial condition for electromagnetic focusing. It corrects the outspread phenomenon of the electron beam caused by differences in initial emitting velocity and angle. The method also addresses shifts in the electron beam due to misalignment between electric and magnetic fields, as well as corrections for Coulomb interactions among emitted electrons. The system ensures that any focusing error remains within an allowable range, repeating operations as necessary.
Career Highlights
Vadim is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in the field of electron-beam lithography. His expertise and contributions have positioned him as a key figure in the development of advanced lithography techniques.
Collaborations
He has collaborated with notable colleagues, including Chang-Wook Moon and Chang-hoon Choi, who share his commitment to advancing technology in their field.
Conclusion
Sidorkin Vadim's work in electron-beam lithography exemplifies the innovative spirit of modern inventors. His patent and contributions to Samsung Electronics Co., Ltd. highlight the importance of precision in semiconductor manufacturing.