Si-Yi Chin

Title: Si-Yi Chin: Innovator in Polyimide and Graphite Technologies

Introduction

Si-Yi Chin is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the fields of polyimide and graphite technologies. With a total of 2 patents, his work has advanced the manufacturing processes and applications of these materials.

Latest Patents

Si-Yi Chin's latest patents include innovative methods for producing polyamic acid and polyimide, as well as a method for manufacturing graphite sheets. One of his notable patents discloses a method of fabricating a graphite sheet, which involves polymerizing diamines and a dianhydride to form a polyamic acid. This polyamic acid is then solvent casted on a substrate and hot baked to create a polyamic acid film or gel film. The film is subsequently biaxially stretched at high temperatures to form a polyimide film, which is carbonized and graphitized to produce a graphite sheet. The diamines and dianhydrides used in this process are specified in various formulas, showcasing the complexity and precision of his work.

Another significant patent focuses on a polyimide film laminate and a metal laminate employing the same. This invention includes multiple layers of polyimide films, each with specific thermal conductivities and breakdown voltages, enhancing the performance and reliability of the laminate materials.

Career Highlights

Si-Yi Chin is affiliated with the Industrial Technology Research Institute, where he continues to innovate and develop new technologies. His work has not only contributed to academic research but has also had practical applications in various industries.

Collaborations

Throughout his career, Si-Yi Chin has collaborated with notable colleagues, including Shou-Jui Hsiang and Wei-Ta Yang. These partnerships have fostered a collaborative environment that enhances the research and development of advanced materials.

Conclusion

Si-Yi Chin's contributions to polyimide and graphite technologies exemplify the impact of innovative thinking in material science. His patents reflect a commitment to advancing manufacturing processes and improving material properties, making him a key figure in his field.