Company Filing History:
Years Active: 2023-2024
Title: Innovations of Shunya Kawaguchi in Silicon Wafer Technology
Introduction
Shunya Kawaguchi is a prominent inventor based in Tokyo, Japan, known for his significant contributions to silicon wafer technology. With a total of two patents to his name, Kawaguchi has made strides in enhancing the robustness and uniformity of silicon wafers, which are crucial components in the semiconductor industry.
Latest Patents
Kawaguchi's latest patents focus on a silicon wafer that features a layer of oxygen precipitates. The manufacturing method he developed allows the wafer to exhibit remarkable robustness, characterized by a specific ratio of average densities from two different treatments. The first treatment involves heating the wafer at approximately 1150° C. for about 2 minutes, followed by a secondary heating phase between 950 to 1000° C. for around 16 hours. The second treatment consists of heating the wafer at about 780° C. for 3 hours, followed by another heating phase at 950 to 1000° C. for 16 hours. This innovative process results in a wafer that demonstrates previously unattainable uniformity, with a ratio of oxygen precipitate densities ranging from 0.77 to 1.30.
Career Highlights
Kawaguchi is currently employed at Sumco Corporation, a leading company in the silicon wafer manufacturing sector. His work has been instrumental in advancing the technology used in semiconductor production, thereby contributing to the overall growth of the industry.
Collaborations
Throughout his career, Kawaguchi has collaborated with notable colleagues, including Kazuhisa Torigoe and Toshiaki Ono. These partnerships have fostered an environment of innovation and have led to the successful development of cutting-edge technologies in silicon wafer manufacturing.
Conclusion
Shunya Kawaguchi's contributions to silicon wafer technology exemplify the impact of innovative thinking in the semiconductor industry. His patents not only enhance the performance of silicon wafers but also pave the way for future advancements in the field.