Company Filing History:
Years Active: 2026
Title: Shunta Nosaka: Innovator in Plasma Processing Technology
Introduction
Shunta Nosaka is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor device manufacturing through his innovative patents. His work focuses on enhancing the accuracy and efficiency of plasma processing technologies.
Latest Patents
Shunta Nosaka holds a patent for a plasma processing apparatus, a data analysis apparatus, and a semiconductor device manufacturing system. This invention is designed to assign appropriate chemical elements or molecules based on the features of peak shapes. It also enables high-accuracy wavelength identification. The plasma processing apparatus includes a processing chamber for plasma processing samples, a radio-frequency power supply for generating plasmas, and a sample table for placing the samples. Additionally, it features an analysis unit that identifies chemical elements or molecules in monitored plasmas by comparing spectral waveforms.
Career Highlights
Shunta Nosaka is currently employed at Hitachi High-Tech Corporation, where he continues to develop advanced technologies in the semiconductor industry. His expertise in plasma processing has positioned him as a key player in the field.
Collaborations
Shunta collaborates with Daisuke Shiraishi, a fellow innovator, to further enhance their research and development efforts in plasma processing technologies.
Conclusion
Shunta Nosaka's contributions to plasma processing technology exemplify the innovative spirit of modern inventors. His work not only advances semiconductor manufacturing but also sets a foundation for future developments in the field.