Hikari, Japan

Shunichi Nakamura


Average Co-Inventor Count = 3.0

ph-index = 5

Forward Citations = 202(Granted Patents)


Location History:

  • Tokuyama, JA (1976)
  • Tokuyama, JP (1986)
  • Hiraki, JP (1988)
  • Hikari, JP (1988 - 1993)

Company Filing History:


Years Active: 1976-1993

Loading Chart...
6 patents (USPTO):Explore Patents

Title: Shunichi Nakamura: Innovator in Microporous Materials

Introduction

Shunichi Nakamura is a prominent inventor based in Hikari, Japan. He has made significant contributions to the field of microporous materials, holding a total of six patents. His innovative work focuses on the development of advanced polyolefin articles and films that have various applications in different industries.

Latest Patents

Nakamura's latest patents include a microporous shaped article and a process for its preparation. This invention discloses a microporous shaped polyolefin article that comprises a polyolefin and synthetic resin particles. The article features a network structure composed of open-cellular pores with a maximum pore diameter of not more than 5 micrometers, achieving a porosity of 20 to 90%. Additionally, he has developed a microporous film and a process for its production. This film consists of a polypropylene material with a network structure of intercommunicating pores, having a maximum pore size smaller than 1 micrometer and an average pore size ranging from 0.005 to 0.6 micrometers.

Career Highlights

Shunichi Nakamura is currently employed at Tokuyama Soda Kabushiki Kaisha, where he continues to innovate in the field of materials science. His work has garnered attention for its potential applications in various sectors, including packaging and filtration.

Collaborations

Nakamura has collaborated with notable coworkers such as Satoshi Nagou and Shingo Kaneko. Their combined expertise has contributed to the advancement of microporous technologies.

Conclusion

Shunichi Nakamura's contributions to the field of microporous materials exemplify his innovative spirit and dedication to advancing technology. His patents reflect a commitment to developing high-performance materials that can meet the demands of modern applications.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…