Hwaseong-si, South Korea

Shuichi Tamamushi


Average Co-Inventor Count = 5.2

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2017-2019

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4 patents (USPTO):Explore Patents

Title: The Innovations of Shuichi Tamamushi

Introduction

Shuichi Tamamushi is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of electron beam technology, holding a total of 4 patents. His work has been instrumental in advancing the capabilities of electron beam apparatuses.

Latest Patents

Tamamushi's latest patents include innovative designs and methods that enhance the functionality of electron beam systems. One of his patents focuses on an aperture system of an electron beam apparatus. This system features multiple apertures, each with a first area containing at least one through hole for electron beam passage and a second area with alignment keys. The design ensures precise alignment and functionality in electron beam applications. Another patent details a method of correcting mask patterns and manufacturing reticles. This method involves preparing a substrate, determining position data for pattern formation, and correcting this data based on deformation rates observed during primary exposure simulations.

Career Highlights

Shuichi Tamamushi is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in the field of electron beam technology. His work at Samsung has allowed him to collaborate with other talented professionals in the industry, further enhancing the impact of his inventions.

Collaborations

Some of his notable coworkers include Jin Hyeock Choi and In-kyun Shin. Their collaborative efforts contribute to the advancement of technology within their field.

Conclusion

Shuichi Tamamushi's contributions to electron beam technology through his patents and work at Samsung Electronics Co., Ltd. highlight his role as a leading inventor in this specialized area. His innovative designs and methods continue to shape the future of electron beam applications.

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